The S2000AFI is manufactured using Multiepitaxial Mesa technology for cost-effective high performance and uses a Hollow Emitter structure to enhance switching speeds. 1 3 2 ISOWATT218 INTERNAL SCHEMATIC DIAGRAM ABSOLUTE MAXIMUM RATINGS Symbol V CES V CEO V EBO IC I CM P t ot T stg Tj Parameter Collector-Emitter Voltage (V BE = 0) Collector-Emitter Voltag.
TICS (Tcase = 25 oC unless otherwise specified) Symb ol I CES I EBO Parameter Collector Cut-off Current (V BE = 0) Emitter Cut-off Current (I C = 0) Test Cond ition s V CE = 1500 V V CE = 1500 V V EB = 5 V I C = 100 mA 700 T C = 125 C o Min. Typ . Max. 1 2 100 Un it mA mA µA V V CEO(sus )∗ Collector-Emitter Sustaining Voltage (I B = 0) V EBO V CE(sat )∗ V BE(s at)∗ Emitter Base Voltage (I C = 0) Collector-Emitter Saturation Voltage Base-Emitter Saturation Voltage INDUCTIVE LOAD Storage Time Fall T ime Transition F requency I E = 10 mA I C = 4.5 A I C = 4.5 A IB = 2 A IB = 2 A 10 1 1.3 .
No. | Partie # | Fabricant | Description | Fiche Technique |
---|---|---|---|---|
1 | S2000AF |
ST Microelectronics |
High voltage NPN Power transistor | |
2 | S2000AF |
SavantIC |
SILICON POWER TRANSISTOR | |
3 | S2000AF1 |
SavantIC |
SILICON POWER TRANSISTOR | |
4 | S2000A |
Toshiba |
Silicon NPN Transistor | |
5 | S2000A |
SavantIC |
SILICON POWER TRANSISTOR | |
6 | S2000 |
Toshiba |
Silicon NPN Transistor | |
7 | S2000 |
INCHANGE |
NPN Transistor | |
8 | S2000 |
SavantIC |
SILICON POWER TRANSISTOR | |
9 | S2000N |
Toshiba Semiconductor |
Silicon NPN Transistor | |
10 | S2000N |
SavantIC |
SILICON POWER TRANSISTOR | |
11 | S2001M |
Loras Industries |
(S2001Mxx) SILICON CONTROLLED RECTIFIER | |
12 | S2001MS2 |
Loras Industries |
(S2001Mxx) SILICON CONTROLLED RECTIFIER |