No. | Partie # | Fabricant | Description | Fiche Technique |
---|---|---|---|---|
|
|
BI Technologies |
(898 / 899 Series) Dual-In-Line Thick Film Resistor Networks o c ∆R 0.70% ∆R 0.50% ∆R 0.25% ∆R 0.50% ∆R 0.25% ∆R 0.25% ∆R 0.25% ∆R 0.50% ∆R 1.00% ∆R 0.25% 200V rms for 1 minute 215°C for 3 minutes MIL-STD-202, Method 215 MIL-STD-202, Method 208 UL-94V-O Rated -55°C to +125°C 4-161 Models 898, 899 www.DataS |
|
|
|
BI Technologies |
(898 / 899 Series) Dual-In-Line Thick Film Resistor Networks o c ∆R 0.70% ∆R 0.50% ∆R 0.25% ∆R 0.50% ∆R 0.25% ∆R 0.25% ∆R 0.25% ∆R 0.50% ∆R 1.00% ∆R 0.25% 200V rms for 1 minute 215°C for 3 minutes MIL-STD-202, Method 215 MIL-STD-202, Method 208 UL-94V-O Rated -55°C to +125°C 4-161 Models 898, 899 www.DataS |
|
|
|
BI Technologies |
(898 / 899 Series) Dual-In-Line Thick Film Resistor Networks o c ∆R 0.70% ∆R 0.50% ∆R 0.25% ∆R 0.50% ∆R 0.25% ∆R 0.25% ∆R 0.25% ∆R 0.50% ∆R 1.00% ∆R 0.25% 200V rms for 1 minute 215°C for 3 minutes MIL-STD-202, Method 215 MIL-STD-202, Method 208 UL-94V-O Rated -55°C to +125°C 4-161 Models 898, 899 www.DataS |
|
|
|
BI Technologies |
(898 / 899 Series) Dual-In-Line Thick Film Resistor Networks o c ∆R 0.70% ∆R 0.50% ∆R 0.25% ∆R 0.50% ∆R 0.25% ∆R 0.25% ∆R 0.25% ∆R 0.50% ∆R 1.00% ∆R 0.25% 200V rms for 1 minute 215°C for 3 minutes MIL-STD-202, Method 215 MIL-STD-202, Method 208 UL-94V-O Rated -55°C to +125°C 4-161 Models 898, 899 www.DataS |
|
|
|
BI Technologies |
(898-Series) Dual-In-Line Thick Film Resistor Networks jumper Specifications subject to change without notice. w 4-161 w w .D a S a t ∆R 0.70% ∆R 0.50% ∆R 0.25% ∆R 0.50% ∆R 0.25% ∆R 0.25% ∆R 0.25% ∆R 0.50% ∆R 1.00% ∆R 0.25% 200V rms for 1 minute 215°C for 3 minutes MIL-STD-202, Method 215 MIL-STD- |
|
|
|
BI Technologies |
(898-Series) Dual-In-Line Thick Film Resistor Networks jumper Specifications subject to change without notice. w 4-161 w w .D a S a t ∆R 0.70% ∆R 0.50% ∆R 0.25% ∆R 0.50% ∆R 0.25% ∆R 0.25% ∆R 0.25% ∆R 0.50% ∆R 1.00% ∆R 0.25% 200V rms for 1 minute 215°C for 3 minutes MIL-STD-202, Method 215 MIL-STD- |
|
|
|
BI Technologies |
(898-Series) Dual-In-Line Thick Film Resistor Networks jumper Specifications subject to change without notice. w 4-161 w w .D a S a t ∆R 0.70% ∆R 0.50% ∆R 0.25% ∆R 0.50% ∆R 0.25% ∆R 0.25% ∆R 0.25% ∆R 0.50% ∆R 1.00% ∆R 0.25% 200V rms for 1 minute 215°C for 3 minutes MIL-STD-202, Method 215 MIL-STD- |
|
|
|
BI Technologies |
(898-Series) Dual-In-Line Thick Film Resistor Networks jumper Specifications subject to change without notice. w 4-161 w w .D a S a t ∆R 0.70% ∆R 0.50% ∆R 0.25% ∆R 0.50% ∆R 0.25% ∆R 0.25% ∆R 0.25% ∆R 0.50% ∆R 1.00% ∆R 0.25% 200V rms for 1 minute 215°C for 3 minutes MIL-STD-202, Method 215 MIL-STD- |
|
|
|
BI Technologies |
(898 / 899 Series) Dual-In-Line Thick Film Resistor Networks o c ∆R 0.70% ∆R 0.50% ∆R 0.25% ∆R 0.50% ∆R 0.25% ∆R 0.25% ∆R 0.25% ∆R 0.50% ∆R 1.00% ∆R 0.25% 200V rms for 1 minute 215°C for 3 minutes MIL-STD-202, Method 215 MIL-STD-202, Method 208 UL-94V-O Rated -55°C to +125°C 4-161 Models 898, 899 www.DataS |
|